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HMDS pretreatment system, HMDS oven
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该企业相似产品
上海隽思实验仪器有限公司（以下简称“隽思仪器”）是一家专业从事仪器设备研发、生产、销售及服务的企业。主要生产半导体工艺设备、环境模拟仪器设备、线缆试验机、橡塑试验检测设备、黑蒜设备等的高新技术型企业，具有很强的自主开发、设计能力,服务于电子、电力、通讯、环保、农业，建筑，节能等行业；多年来，公司以“真挚的服务、优质的品质”为宗旨，为国内外广大用户提供了周到的售前、售中、售后服务。赢得了国内外客户的*好评，更为我们业务的快速发展奠定了一定的基础。我们的服务也更精益求精，更完善！
隽思仪器主要业务有HMDS预处理系统，HMDS烘箱，洁净烤箱，百级洁净烘箱，氮气烘箱，高温无氧烘箱，真空无氧烘箱，无尘无氧化烘箱，抗粘剂涂胶机，精密恒温加热台，快速高低温气流仪，超低温试验箱，高低温试验箱，高低温交变湿热箱定做，HMDS真空涂胶烘箱，低温脆性检测仪，黑蒜发酵设备，导体直流电阻测试仪，电线电缆检测仪器，真空烘箱，黑蒜试验机，橡塑检测试验机等。
不断追求技术进步、提升专业服务能力，做一个专业的仪器设备供应商是我们的发展目标。企业内部实施了CRM、ERP项目管理，在产品开发、质量控制、集成供应链、人力资源管理、财务管理等诸多方面取得了长足发展。同时建立了标准化的服务流程，形成了覆盖全国的快速服务网络，以尽心尽责的服务理念和完备的技术得到用户的*称赞。我们将珍视每一次与您合做的机会，以饱满的热情、真诚的服务与您共创灿烂的未来！
详细信息
HMDS Pretreatment System, HMDS Oven Importance：
In the semiconductor production process, lithography is an important part of the integrated circuit graphics transfer process, the quality of glue directly affect the quality of lithography, coating process is also particularly important. Most of the photoresist in the photoresist process is hydrophobic, and the hydroxyl and residual water molecules on the surface of the wafer are hydrophilic, which results in poor adhesion of the photoresist and the silicon wafer, When developing, the developer intrudes into the connection between the photoresist and the silicon wafer, which is liable to cause the failure of the photographic pattern transfer, and the lateral corrosion is liable to occur. The thickener HMDS (hexamethyldisilazane) can well improve this condition. HMDS will be applied to the semiconductor manufacturing silicon, gallium arsenide, lithium niobate, glass, sapphire, wafer and other materials, the surface of the reaction by the oven to generate the silicone-based compounds. It succeeds in turning the surface of the wafer from hydrophobic to hydrophobic, and its hydrophobic base is well combined with the photoresist and acts as a coupling agent.
HMDS pretreatment system, HMDS oven Role:
The HMDS pretreatment system can uniformly coat a layer of HMDS on the surface of the wafer and substrate by reducing the working temperature, processing time and processing time of the oven pretreatment process, reducing the contact angle of the silicon wafer after HMDS treatment The amount of photoresist to improve the adhesion of photoresist and silicon.
HMDS pretreatment system, HMDS oven Characteristics:
1, Pre-processing performance better
2, The treatment is more uniform
3, High efficiency
4, More savings liquid
5, More environmentally friendly and safe
6, Low-pressure alarm device
7, Can automatically draw HMDS function
8, Can automatically add HMDS function
9, HMDS liquid leakage alarm function
10, HMDS emergency evacuation function
11, Data record printing function
