工业显微镜广泛应用于半导体,电子工业进行晶体,集成电路的检验和科学研究.
配备有反射照明,成象和观察系统,偏光装置.
Industrial microscope is widely used for crystal, integrated circuit (IC) examination
and research. It is supplied with reflected illumination, imaging and viewing system,
polarized imaging system.
规格 Specifications
◇ 无限远光学系统,管镜焦距200mm
Infinitive Optical System, Tube Lens Focal Length 200mm
◇ 铰链式三目镜筒,30°倾斜, 瞳距55-75mm
Compensation Free Trinocular Tube, Inclined at 30°, Interpupillary Distance 55-75mm
◇ 高眼点,大视场目镜WF10X/22
High Point and Wide Field Eyepiece WF10/22
◇ 长工作距离,平场复消色差物镜2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
Long Working Distance, Plan Apo Objectives 2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
◇ 五孔物镜转换器
Quintuple Nosepiece
◇ 6″双层活动平台和圆平台
6″Double Layers Mechanical Stage and circle stage
◇ 同轴粗微调焦机构,微动格值0.002mm
Coaxial Coarse & Fin Focus Adjustment System, Fine Division 0.002mm
◇照明系统 Illumination System
冷光源光纤反射照明器:12V150W
Cold Light Fiber Reflected Illnminator: 12V150W
