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Helios 6 HD Focused Ion Beam Scanning Electron Microscope
面议Scanning Transmission Electron Microscopy Sample Holder for Desktop SEM
面议用于半导体的 Helios G4 UX DualBeam
面议树脂安装插件
面议用于半导体的 Themis™ S S/TEM
面议用于半导体的 Helios™ G4 PFIB Hxe DualBeam™
面议用于半导体的 Helios™ NanoLab™ 1200AT DualBeam™
面议用于半导体的 Helios™ G4 HX DualBeam™
面议用于材料科学的 Helios 5 CX DualBeam
面议The ultra-high-energy ion gun features a maximum accelerating voltage of 16 kV to rapidly mill and polish sample surfaces.
The CleanMill System can be configured with an optional low-energy io n gun for final polishing of sample surfaces.
The system delivers ion energy ranging from 2 kV to 16 kV and features dedicated optics for ultra-low-voltage polishing from 100 V to 2 kV.
Safely transfer samples from the CleanMill System to the microscope chamber using the Thermo Scientific IGST (inert gas sample transfer) Workflow to observe materials in their native states.
The integrated touchscreen and high-resolution camera help you keep track of the broad ion beam milling process.
The optional cryo-stage delivers LN2 cooling with automatic refilling for working with extremely beam-sensitive materials.